Make 3nm Chip with DUV Lithography Mechanism! In most cases, we can directly tell that DUV LELE is much cheaper than EUV single exposure (SE). In addition, DUV LE4 is cheaper than EUV dual patterning. Although LELE requires additional steps compared to SE, there are also EUV system maintenance versus DUV system maintenance and energy consumption to consider. DUV LELE uses half the energy of EUV SE, DUV SADP about 2/3, and even DUV LE4 uses only 85% of the energy of EUV SE.
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